Direct-write grayscale lithography

被引：55

作者：

Grushina, Anya ^{[1
]}

机构：

[1] Heidelberg Instruments Mikrotech GmbH, Heidelberg, Germany

来源：

ADVANCED OPTICAL TECHNOLOGIES | 2019年 / 8卷 / 3-4期

关键词：

micro-optical devices; microstructure fabrication; nanostructure fabrication; three-dimensional lithography; SCANNING PROBE LITHOGRAPHY; HIGH-ASPECT-RATIO; NANOSTRUCTURES; FABRICATION; OPTICS;

D O I：

10.1515/aot-2019-0024

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Grayscale lithography is used to produce three-dimensional (3D) structures on micro-and nanoscale. During the last decade, micro-optics and other applications were actively pushing the market demand for such structures. Direct-write systems that use lasers and heated scanning probes can be used for high-precision grayscale micro-and nanolithography. They provide solutions for the most demanding applications in research and industrial manufacturing. At both the micro-and nanoscale, though, some challenges remain, mainly related to throughput. Ongoing R&D efforts and emerging new applications drive several companies to join forces in order to meet the market demands for grayscale lithography of today and in the future.

引用

页码：163 / 169

页数：7

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