Electron lithography using a compact plasma focus

被引:74
作者
Lee, P [1 ]
Feng, X [1 ]
Zhang, GX [1 ]
Liu, MH [1 ]
Lee, S [1 ]
机构
[1] NANYANG TECHNOL UNIV,DIV PHYS,NATL INST EDUC,SINGAPORE 259756,SINGAPORE
关键词
D O I
10.1088/0963-0252/6/3/011
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A 1.6 kJ plasma focus source was demonstrated as an electron source for microlithography. Resolution better than 0.5 mu m was obtained. The total energy in the beam and the energy of electrons was estimated from the lithographs to be >20 mJ per shot with energy >20 keV and >1 J with energy similar to 10 keV.
引用
收藏
页码:343 / 348
页数:6
相关论文
共 16 条
[1]   Optical and x-ray observations of carbon and aluminium fibre Z-pinch plasmas [J].
Beg, FN ;
Dangor, AE ;
Lee, P ;
Tatarakis, M ;
Niffikeer, SL ;
Haines, MG .
PLASMA PHYSICS AND CONTROLLED FUSION, 1997, 39 (01) :1-25
[2]  
BOCHKOV VD, 1995, P C LOW TEMP PLASM P
[3]   EXPERIMENTAL RESULTS FROM FAST ELECTRON PATTERN GENERATOR - A VARIABLE SHAPED BEAM MACHINE [J].
DECHAMBOST, E ;
ALLANOS, B ;
FRICHET, A ;
PERROCHEAU, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :73-77
[4]  
Filippov N. V., 1962, NUCL FUSION S, VPt 2, P577
[5]  
Kaye G. W. C., 1986, KAYE LABY TABLES PHY
[6]  
Lee S., 1996, Singapore Journal of Physics, V12, P69
[7]  
Mather J. W., 1964, PHYS FLUIDS, V7, P5
[8]   FORMATION OF A HIGH-DENSITY DEUTERIUM PLASMA FOCUS [J].
MATHER, JW .
PHYSICS OF FLUIDS, 1965, 8 (02) :366-&
[9]  
NAKAYAMA Y, 1991, J VAC SCI TECHNOL B, V8, P3113
[10]  
Petrov P. P., 1960, PLASMA PHYS PROBL, V4, P198