Electron lithography using a compact plasma focus

被引：74

作者：

Lee, P ^{[1
]}

Feng, X ^{[1
]}

Zhang, GX ^{[1
]}

Liu, MH ^{[1
]}

Lee, S ^{[1
]}

机构：

[1] NANYANG TECHNOL UNIV,DIV PHYS,NATL INST EDUC,SINGAPORE 259756,SINGAPORE

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 1997年 / 6卷 / 03期

关键词：

D O I：

10.1088/0963-0252/6/3/011

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A 1.6 kJ plasma focus source was demonstrated as an electron source for microlithography. Resolution better than 0.5 mu m was obtained. The total energy in the beam and the energy of electrons was estimated from the lithographs to be >20 mJ per shot with energy >20 keV and >1 J with energy similar to 10 keV.

引用

页码：343 / 348

页数：6

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