Growth studies of (Nb2O5)(1-x):XTiO2 & (Nb2O5)(1-X)&COLCHEM;XSiO2 single crystals and their dielectric behaviors

被引:0
作者
Choosuwan, H [1 ]
Guo, R
Bhalla, AS
Balachandran, U
机构
[1] Penn State Univ, Mat Res Lab, University Pk, PA 16802 USA
[2] Argonne Natl Lab, Div Energy Technol, Argonne, IL 60439 USA
关键词
dielectric properties; relaxation process; Nb2O5-TiO2; Nb2O5-SiO2; single crystal; LHPG technique;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nb2O5:TiO2 and Nb2O5:SiO2 systems show interesting dielectric properties. This presentation describes recent progress in growing (Nb2O5)(1-x):xTiO(2), (Nb2O5)(1-x):xSiO(2) ,x=0.05, single crystals by the laser heated pedestal growth (LHPG) technique and their dielectric behavior. Ceramic rods were used as seed and feed prepared by the mixed oxide method. Growth conditions such as temperature of melting zone and pulling rate were adjusted for each composition. Crystal symmetry and Growth direction were investigated by X-ray diffraction and Laue back-reflection analysis. Temperature dependences of the dielectric constant and loss tangent were measured over a broad frequency range (1 KHz-1 MHz) on sample cut parallel and the perpendicular to the growth direction.
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页码:1285 / 1293
页数:9
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