Effectiveness of non-linear graded buffers for In(Ga,Al)As metamorphic layers grown on GaAs (001)

被引:44
作者
Choi, H. [1 ]
Jeong, Y. [2 ]
Cho, J. [1 ]
Jeon, M. H. [1 ]
机构
[1] Inje Univ, Dept Nano Syst Engn, Ctr Nano Mfg, Gimhae Gyongnam 621749, South Korea
[2] JAIST, Nomi, Ishikawa 9231292, Japan
关键词
Line defects; Molecular beam epitaxy; Semiconducting III-V materials; High electron mobility transistors; MOLECULAR-BEAM EPITAXY; DISLOCATION DENSITY REDUCTION; FIELD-EFFECT TRANSISTORS; ELECTRON-TRANSPORT; GAAS(001); GHZ;
D O I
10.1016/j.jcrysgro.2008.10.116
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We investigated the effectiveness of non-linear graded buffers for metamorphic In(Ga,Al)As layers grown on GaAs (001). The metamorphic In(Ga,Al)As layers with three types of graded buffers were grown on semi-insulating GaAs (001) Substrates by means of molecular beam epitaxy. Materials were characterized by using atomic force microscopy, transmission electron microscopy, X-ray diffraction, Hall measurement, and photoluminescence. We found a tendency that the convex type is effective in enhancing optical and electron transport properties of the InGaAs metamorphic layers on GaAs. This can be attributed to alloy-hardening gradient of the graded buffers and different pair-annihilation probability in the InGaAs metamorphic layers. Electron transport properties with regard to the InGaAs/InAlAs metamorphic high electron mobility heterostructures on GaAs are independent on the types of graded buffers; near-surface threading dislocation densities of the graded buffers are on the order of 10(8) cm (2), which are insensitive densities in changing the electron transport properties in the heterostructures. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:1091 / 1095
页数:5
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