Why is diffusion in metals and on metal surfaces universal?

被引:16
作者
Flynn, CP
机构
[1] Univ Illinois, Dept Phys, Urbana, IL 61801 USA
[2] Univ Illinois, Mat Res Lab, Urbana, IL 61801 USA
关键词
D O I
10.1088/0953-8984/18/16/S05
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Recent experiments that determine mass diffusion D, on the close packed surfaces of vacuum compatible metals are reviewed. The results turn out to be approximately universal when scaled to homologous temperatures T/T-m with T-m, the melting temperature. Similar behaviour for vacancy-driven diffusion in bulk metals has been recognized for decades. Remarkably, the uncertainty with which this scaling occurs is only similar to 10%. Possible origins of the universality are discussed.
引用
收藏
页码:S439 / S445
页数:7
相关论文
共 14 条
[11]  
Pimpinelli A., 1998, Physics of crystal growth Cambridge University Press, Cambridge, U.K
[12]   Shape and stability of self-assembled surface domains [J].
Thayer, GE ;
Hannon, JB ;
Tromp, RM .
NATURE MATERIALS, 2004, 3 (02) :95-98
[13]   Thermal adatoms an Si(001) [J].
Tromp, RM ;
Mankos, M .
PHYSICAL REVIEW LETTERS, 1998, 81 (05) :1050-1053
[14]   FREQUENCY FACTORS AND ISOTOPE EFFECTS IN SOLID STATE RATE PROCESSES [J].
VINEYARD, GH .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1957, 3 (1-2) :121-127