Atomic force microscope based Kelvin measurements: Application to an electrochemical reaction

被引:27
作者
Bohmisch, M
Burmeister, F
Rettenberger, A
Zimmermann, J
Boneberg, J
Leiderer, P
机构
[1] Universitaet Konstanz, Konstanz
关键词
D O I
10.1021/jp9728767
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An atomic force microscope (AFM) was utilized as a Kelvin probe to determine work functions of several metals and semiconductors quantitatively. Most of the experimental data show excellent agreement with published values measured by photoemission, Variations in work functions as low as 5 mV could be detected with a typical lateral resolution of 20 nm. This method allowed us to analyze and explain the energetics of an electrochemical reaction on the surface of WSe2, which could be in situ induced and controlled by an externally applied voltage between AFM tip and sample. Thus it could be exploited for etching nanostructures.
引用
收藏
页码:10162 / 10165
页数:4
相关论文
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