Study of PS-PMMA diblock copolymer in solution using UV, DSC, and light-scattering techniques

被引:5
|
作者
Gosa, KL
Serban, S
Christopoulou, V
Papanagopoulos, D
Dondos, A
机构
[1] Chem Res Inst, Bucharest 77208, Romania
[2] Univ Patras, Dept Chem Engn, Patras 26500, Greece
[3] FORTH, Inst Chem Engn & High Temp Proc, ICE, Patras 26500, Greece
关键词
PS-PMMA diblock copolymer; UV; DSC; light scattering; segregated conformation; pseudo-Gaussian conformation;
D O I
10.1081/PPT-100100017
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Two well-characterized samples of polystyrene-poly(methyl methacrylate) diblock copolymers have been studied in solution. The ultraviolet spectroscopy, differential scanning calorimetry, and light-scattering techniques have shown that in a temperature region between 30 degrees C and 40 degrees C, the copolymer exhibits a conformational transition. The obtained results have also shown that below the transition temperature region, a more or less segregated conformation is adopted, and a pseudo-Gaussian conformation is adopted above this temperature region.
引用
收藏
页码:95 / 104
页数:10
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