Study of PS-PMMA diblock copolymer in solution using UV, DSC, and light-scattering techniques

被引：5

作者：

Gosa, KL

Serban, S

Christopoulou, V

Papanagopoulos, D

Dondos, A

机构：

[1] Chem Res Inst, Bucharest 77208, Romania

[2] Univ Patras, Dept Chem Engn, Patras 26500, Greece

[3] FORTH, Inst Chem Engn & High Temp Proc, ICE, Patras 26500, Greece

来源：

POLYMER-PLASTICS TECHNOLOGY AND ENGINEERING | 2000年 / 39卷 / 01期

关键词：

PS-PMMA diblock copolymer; UV; DSC; light scattering; segregated conformation; pseudo-Gaussian conformation;

D O I：

10.1081/PPT-100100017

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Two well-characterized samples of polystyrene-poly(methyl methacrylate) diblock copolymers have been studied in solution. The ultraviolet spectroscopy, differential scanning calorimetry, and light-scattering techniques have shown that in a temperature region between 30 degrees C and 40 degrees C, the copolymer exhibits a conformational transition. The obtained results have also shown that below the transition temperature region, a more or less segregated conformation is adopted, and a pseudo-Gaussian conformation is adopted above this temperature region.

引用

页码：95 / 104

页数：10

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