Improvement of crystallinity of ZnO thin film and electrical characteristics of film bulk acoustic wave resonator by using Pt buffer layer

被引:22
作者
Yamada, H [1 ]
Ushimi, Y [1 ]
Takeuchi, M [1 ]
Yoshino, Y [1 ]
Makino, T [1 ]
Arai, S [1 ]
机构
[1] Murata Mfg Co Ltd, Kyoto, Japan
关键词
ZnO; buffer layer; BAW; crystallinity; piezoelectric; electrical characteristics;
D O I
10.1016/j.vacuum.2004.01.061
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Crystallinity of ZnO thin film for film bulk acoustic wave (BAW) resonator has been successfully improved by using Pt/Al bottom electrode. The lattice mismatch of ZnO c-plane and Pt (1 1 1) plane is as small as 1.4% so that we could obtain good crystallinity ZnO film on Pt surface. The effective electromechanical coupling coefficient (kt(eff)(2)) of the BAW resonator that we fabricated with AI/ZnO/Pt/Al/SiO2 structure is 5.6%. It is larger than that of Al/ZnO/Al/SiO2 structure BAW resonator, whose value is 4.9%. The kt(eff)(2) is improved by using the Pt/Al bottom electrode without decreasing the quality factor. The kt(eff)(2) of BAW resonator strongly depends on the crystallinity of ZnO film. Using Pt buffer layer to protect Al electrode from its oxidation is very effective to improve the crystallinity of ZnO film and the kt(eff)(2) of BAW resonator. eff (C) 2004 Published by Elsevier Ltd.
引用
收藏
页码:689 / 692
页数:4
相关论文
共 8 条
[1]   PIEZOELECTRIC PROPERTIES OF ZINC-OXIDE FILMS ON GLASS SUBSTRATES DEPOSITED BY RF-MAGNETRON-MODE ELECTRON-CYCLOTRON-RESONANCE SPUTTERING SYSTEM [J].
KADOTA, M ;
MINAKATA, M .
IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, 1995, 42 (03) :345-350
[2]  
Lim WT, 1999, THIN SOLID FILMS, V353, P12, DOI 10.1016/S0040-6090(99)00390-9
[3]   Effective electromechanical coupling coefficient (kt2) for fundamental mode of thickness extensional mode thin film bulk acoustic wave resonator fabricated by ZnO thin film [J].
Takeuchi, M ;
Yamada, H ;
Yoshino, Y ;
Makino, T ;
Arai, S .
VACUUM, 2002, 66 (3-4) :463-466
[4]   Influence of oxygen partial pressure on transparency and conductivity of RF sputtered Al-doped ZnO thin films [J].
Tsuji, T ;
Hirohashi, M .
APPLIED SURFACE SCIENCE, 2000, 157 (1-2) :47-51
[5]   Control of temperature coefficient of frequency in zinc oxide thin film bulk acoustic wave resonators at various frequency ranges [J].
Yoshino, Y ;
Takeuchi, M ;
Inoue, K ;
Makino, T ;
Arai, S ;
Hata, T .
VACUUM, 2002, 66 (3-4) :467-472
[6]   Effect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates [J].
Yoshino, Y ;
Inoue, K ;
Takeuchi, M ;
Makino, T ;
Katayama, Y ;
Hata, T .
VACUUM, 2000, 59 (2-3) :403-410
[7]  
YOSHINO Y, 1997, MATER RES SOC S P, P441
[8]  
YOSHINO Y, 2000, IEE JAPAN E, V120, P547