Observations of extreme ultraviolet emission from plasma produced by capillary discharges

被引：7

作者：

Nowakowska-Langier, K. ^{[1
]}

Jakubowski, L. ^{[1
]}

Baronova, E. O. ^{[2
]}

Czaus, K. ^{[1
]}

Rabinski, M. ^{[1
]}

Jakubowski, M. J. ^{[1
]}

机构：

[1] Andrzej Soltan Inst Nucl Studies IPJ, PL-05400 Otwock, Poland

[2] NRC Kurchatov Inst, Nucl Fus Inst, Moscow 123182, Russia

来源：

EUROPEAN PHYSICAL JOURNAL D | 2009年 / 54卷 / 02期

关键词：

SOFT-X-RAY; EUV-LITHOGRAPHY; DIAGNOSTICS; RADIATION;

D O I：

10.1140/epjd/e2009-00047-3

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This study reports the results of a pilot experiment concerning observations of extreme ultraviolet emission from plasma produced by the capillary discharges. A few kA current was applied across the gas-filled alumina capillary (1 mm diameter and 8 mm long) to generate radiation in the EUV region (12-63 nm). Spectroscopic studies were carried out by means of a XEUV spectrometer which was upgraded for special lithography purposes. The results obtained from the EUV spectroscopic measurements provided information about the radiation processes from xenon and argon plasma and testifies that given capillary is an effective source of EUV emission. Additionally we showed a simulation which describes plasma dynamics parameters and dynamics of various ionization stages in capillary discharge. Our computer simulation confirmed the presence of ions, which spectra was registered in the experiment.

引用

页码：377 / 382

页数：6

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