Chemisorption geometry of NO on Rh(111) by X-ray photoelectron diffraction

被引:67
作者
Kim, YJ
Thevuthasan, S
Herman, GS
Peden, CHF
Chambers, SA
Belton, DN
Permana, H
机构
[1] PACIFIC NW NATL LAB,ENVIRONM MOL SCI LAB,RICHLAND,WA 99352
[2] GM CORP,RES & DEV LAB,WARREN,MI 48090
关键词
nitrogen oxides; photoelectron diffraction; rhodium; solid-gas interfaces; surface chemical reaction;
D O I
10.1016/0039-6028(96)00027-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adlayer structure of (2 x 2)-3NO on Rh(111) has been investigated by high-energy, scanned-angle X-ray photoelectron diffraction (XPD) in conjunction with single scattering cluster theory and R-factor analysis. In addition, a plausible adlayer registry, consistent with previously published HREELS data, is deduced by means of physical reasoning. The resulting structural model consists of NO bound to atop, three-fold hollow fee, and three-fold hollow hcp sites through the N atom with an NO bond length of 1.15 Angstrom. NO molecules at all three sites within the adlayer are oriented normal to the surface. The Z coordinates (Z being defined as perpendicular to the surface) of atop and hollow-site NO molecules relative to the top layer of Rh atoms differ by 0.5 Angstrom, with hollow-site NO being bound more closely to the substrate. This structure differs considerably from one proposed previously by a LEED I-V analysis in both the site occupancy and the spacing of NO molecules within the adlayer.
引用
收藏
页码:269 / 279
页数:11
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