Seeding of polymer substrates for nanocrystalline diamond film growth

被引：21

作者：

Kromka, A. ^{[1
]}

Babchenko, O. ^{[1
]}

Kozak, H. ^{[1
]}

Hruska, K. ^{[1
]}

Rezek, B. ^{[1
]}

Ledinsky, M. ^{[1
]}

Potmesil, J. ^{[1
]}

Michalka, M. ^{[2
]}

Vanecek, M. ^{[1
]}

机构：

[1] Acad Sci Czech Republ, Inst Phys, Prague 16253, Czech Republic

[2] Ctr Int Laser, Bratislava 81219, Slovakia

来源：

关键词：

Nanocrystalline diamond; Chemical vapor deposition; Polymer; Scanning electron microscopy; THIN-FILMS; SURFACE; NUCLEATION; CARBON;

D O I：

10.1016/j.diamond.2009.01.023

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanocrystalline diamond (NCD) thin films and structures are grown by microwave plasma CVD technique on SiO2/Si substrates patterned by polymer. The substrates are seeded by ultra-dispersed diamond (UDD) nanoparticles in polymer. by spin coating of UDD drop and by ultrasonic treatment in solution of UDD. For all samples, the deposited NCD film is strongly related to the primary polymer deposited over the Si/SiO2 substrate. For a certain concentration of UDD, seeding by polymer composite results in formation of fully closed layer. The drop of UDD requires using of spin coating process and by repeating of this procedure, a NCD layer with clear 3D geometry is achieved. Ultrasonic treatment leads in "implanting" of UDD into the polymer bulk. The primary polymer stripes are damaged during this procedure. In addition, 3D porous like layer is observed after the CVD growth. Optimizing the seeding procedure and the dimension of the primary polymer allow a direct growth of self-standing air bridges suitable for MEMS/NEMS applications. (C) 2009 Published by Elsevier B.V.

引用

页码：734 / 739

页数：6

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