Texture of electroplated copper film under biaxial stress

被引:12
|
作者
Hong, Bo [1 ]
Jiang, Chuan-hai [1 ]
Wang, Xin-jian [1 ]
机构
[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200240, Peoples R China
关键词
electroplated copper film; X-ray diffraction; texture; stress;
D O I
10.2320/matertrans.47.2299
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The stresses and the textures of electroplated copper films were studied using the X-ray diffraction analysis. The results show that the stresses in the films are always tensile. The films have (110) fiber texture at different thickness from 8 to 60 pm. From strain energy minimization point of view, the grains with (110) orientation should be favorable in these films. A further planar texture on top of the fiber texture was developed. It could be explained by elastic anisotropy at different orientation in grain.
引用
收藏
页码:2299 / 2301
页数:3
相关论文
共 50 条
  • [1] Texture of electroplated copper film under biaxial stress
    Hong, Bo
    Jiang, Chuan-Hai
    Wang, Xin-Jian
    Mater. Trans., 9 (2299-2301):
  • [2] ELASTIC ANISOTROPY OF COPPER WITH (001) [100] TEXTURE UNDER BIAXIAL STRESS
    ALTHOFF, J
    MATUCHA, KH
    WINCIERZ, P
    ZEITSCHRIFT FUR METALLKUNDE, 1972, 63 (10): : 615 - &
  • [3] Micro Texture Dependence of the Mechanical and Electrical Reliability of Electroplated Copper Thin Film Interconnections
    Murata, Naokazu
    Saito, Naoki
    Endo, Fumiaki
    Tamakawa, Kinji
    Suzuki, Ken
    Miura, Hideo
    2011 IEEE 61ST ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC), 2011, : 2119 - 2125
  • [4] Texture development of blanket electroplated copper films
    Lingk, C
    Gross, ME
    Brown, WL
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (05) : 2232 - 2236
  • [5] Texture of electroplated coatings of copper and bismuth telluride
    Chaouni, H., 1600, Trans Tech Publ, Aedermannsdorf (157-6):
  • [6] Texture development of blanket electroplated copper films
    Lingk, C.
    Gross, M.E.
    Brown, W.L.
    1600, American Institute of Physics Inc. (87):
  • [7] Texture development of blanket electroplated copper films
    Lingk, C.
    Gross, M.E.
    Brown, W.L.
    1600, American Inst of Physics, Woodbury, NY, USA (87):
  • [8] Microstructure and texture of electroplated copper in damascene structures
    Gross, ME
    Lingk, C
    Siegrist, T
    Coleman, E
    Brown, WL
    Ueno, K
    Tsuchiya, Y
    Itoh, N
    Ritzdorf, T
    Turner, J
    Gibbons, K
    Klawuhn, E
    Biberger, M
    Lai, WYC
    Miner, JF
    Wu, G
    Zhang, F
    ADVANCED INTERCONNECTS AND CONTACT MATERIALS AND PROCESSES FOR FUTURE INTEGRATED CIRCUITS, 1998, 514 : 293 - 298
  • [9] Stress and impurities in electroplated copper
    Brongersma, SH
    Kerr, E
    Vervoort, I
    Richard, E
    Maex, K
    ADVANCED METALLIZATION CONFERENCE 2000 (AMC 2000), 2001, : 161 - 165
  • [10] Simulation of texture development caused stress build-up in electroplated copper lines
    Ceric, H.
    Hollauer, Ch.
    Selberherr, S.
    IPFA 2006: PROCEEDINGS OF THE 13TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS, 2006, : 359 - +