Effects of electron-phonon interaction and chemical shift on near-band-edge recombination in GaN

被引:13
作者
Germain, M
Kartheuser, E
Gurskii, AL
Lutsenko, EV
Marko, IP
Pavlovskii, VN
Yablonskii, GP
Heime, K
Heuken, M
Schineller, B
机构
[1] Univ Liege, Inst Phys, B-4000 Liege, Belgium
[2] Natl Acad Sci Belarus, Inst Phys, Minsk 220072, BELARUS
[3] Rhein Westfal TH Aachen, Inst Halbleitertech I, D-52056 Aachen, Germany
[4] AIXTRON AG, D-52072 Aachen, Germany
关键词
D O I
10.1063/1.1471368
中图分类号
O59 [应用物理学];
学科分类号
摘要
A coherent analysis of the near-band-edge luminescence spectra of undoped and Si-doped GaN layers grown by metalorganic vapor phase epitaxy on a sapphire substrate has been performed with a model including the effect of the charge carrier-longitudinal optical (LO) phonon interaction, based on Frohlich's polaron theory. This model allows one to correlate the relative intensities of the phonon sidebands to the position of the zero-phonon line from which ionization energies are obtained. Moreover, central-cell corrections are taken into account using two different models: the quantum defect model and the Lucovsky model [Solid State Comm. 3, 299 (1965)]. The effect of the electron-LO phonon interaction has been included in these models. Comparison between theory and experiment through the Huang-Rhys factor [Proc. Roy Soc. A204, 406 (1950)] allows a precise determination of the impurity binding energies and effective radii, as well as a reliable characterization of the charge carrier-LO phonon interaction. (C) 2002 American Institute of Physics.
引用
收藏
页码:9827 / 9834
页数:8
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