Formation of atomic secondary ions in sputtering

被引：39

作者：

Wucher, A. ^{[1
]}

机构：

[1] Univ Duisburg Essen, Fachbereich Phys, D-47048 Duisburg, Germany

来源：

APPLIED SURFACE SCIENCE | 2008年 / 255卷 / 04期

关键词：

Ion formation; Ionization probability; Ionization mechanism; Oxygen effect;

D O I：

10.1016/j.apsusc.2008.05.252

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Although being investigated for decades, the formation of atomic secondary ions in sputtering is still not completely understood. By briefly summarizing the available information on velocity and work function dependences of measured ionization probabilities, we show that the formation of practically all analytically useful ions is governed by a combination of non-adiabatic and substrate excitation related ionization mechanisms. We also demonstrate that the oxygen matrix effect can be well described by assuming a statistical distribution of oxygen atoms within the surface emission zone. (C) 2008 Elsevier B. V. All rights reserved.

引用

页码：1194 / 1200

页数：7

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