Difference in the outermost layer between TaB2(0001) and HfB2(0001)

被引:40
|
作者
Yamamoto, K
Kobayashi, K
Kawanowa, H
Souda, R
机构
[1] Kanagawa Inst Technol, Atsugi, Kanagawa 2430292, Japan
[2] Natl Inst Res Inorgan Mat, Tsukuba, Ibaraki 3050044, Japan
关键词
D O I
10.1103/PhysRevB.60.15617
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Atomic and electronic structures of TaB2(0001) and HfB2(0001) surfaces are investigated with use of the first-principles pseudopotential calculations. Our calculated surface formation energies indicate that the graphitic-boron-terminated TaB2(0001) surface is energetically more favorable, whereas the HfB2(0001) surface prefers termination with a close-packed Hf layer. These Endings are consistent with experimental facts. We have also found the difference in the surface relaxation between them. The first interlayer spacing of the B-terminated TaB2 surface is expanded by 0.39%. On the other hand, the outermost Hf-terminated HfB2 surface is contracted by 4.8%. [S0163-1829(99)05147-4].
引用
收藏
页码:15617 / 15620
页数:4
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