A High-Current Electron Gun Integrated with a Magnetron Sputtering System

被引：3

作者：

Kiziridi, P. P. ^{[1
]}

Markov, A. B. ^{[1
]}

Ozur, G. E. ^{[1
]}

Padey, A. G. ^{[1
]}

Yakovlev, E. V. ^{[1
]}

机构：

[1] Russian Acad Sci, Siberian Branch, Inst High Current Elect, Tomsk 634055, Russia

来源：

INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 2018年 / 61卷 / 03期

关键词：

SURFACE ALLOYS; LOW-ENERGY; BEAM;

D O I：

10.1134/S0020441218020161

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The description and the main performance specifications are presented for a device in which a high-current electron gun and a magnetron sputtering system are integrated in a common casing. This device is efficient for surface alloying on metallic materials. It is shown that the magnetic system of the magnetron does not degrade the characteristics of an electron beam that is formed in the gun and passed through a hole in the magnetron sputtering system.

引用

页码：433 / 435

页数：3

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