Young's modulus extraction of epitaxial heterostructure AlGaN/GaN for MEMS application

被引:16
|
作者
Ben Amar, Achraf [1 ]
Faucher, Marc [1 ]
Brandli, Virginie [1 ]
Cordier, Yvon [2 ]
Theron, Didier [1 ]
机构
[1] CNRS UMR 8520, IEMN, F-59652 Villeneuve Dascq, France
[2] CNRS UPR 10, CRHEA, F-06560 Valbonne, France
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2014年 / 211卷 / 07期
关键词
finite elements modeling (FEM); group III-nitrides; heterostructure AlGaN/GaN; MEMS; Young's modulus; THIN-FILMS; PIEZOELECTRIC POLARIZATION; MECHANICAL-PROPERTIES; ELASTIC PROPERTIES; GAN; CANTILEVERS; NITRIDE; ALN;
D O I
10.1002/pssa.201330339
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper presents a Young's modulus extraction method for thin film group III-nitrides materials such as GaN, AlN, and its ternary AlGaN. The AlGaN/GaN heterostructures are grown by molecular beam epitaxy on Si (111) substrate and designed for MEMS applications. Various cantilevers with a width of 10 mu m and lengths going from 100 to 310 mu m were fabricated. The Young's moduli are determined using the resonance frequencies measured by laser Doppler vibrometry (LDV). Finite element modeling (FEM) is used to consider the under-etching of the cantilevers at the anchor. In this study, we find that the Young moduli of GaN and AlN layers are respectively 261 +/- 60 GPa and 339 +/- 78 GPa that compares well with the results found in the literature for bulk materials. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:1655 / 1659
页数:5
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