High power short pulse laser modules for laser produced plasma EUV source

被引：1

作者：

Ellwi, S ^{[1
]}

Comley, A ^{[1
]}

Hay, N ^{[1
]}

Brownell, M ^{[1
]}

机构：

[1] Powerlase Ltd, Crawley RH10 9RA, W Sussex, England

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VIII | 2004年 / 5374卷

关键词：

EUV source; EUV lithography; lasers; Cost of Ownership; laser produced plasma; xenon; tin;

D O I：

10.1117/12.534015

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have recently made significant steps forward in the performance of our laser driver module employed in our laser-produced plasma (LPP) EUV source. We have increased the average power output from the laser whilst minimising the overall Cost of Ownership (COO) and footprint of the system. In addition to minimising the Coo of the laser solution, it is necessary to choose an appropriate target that can attain the overall requirements of EUVL. We are currently investigating solid xenon jets, as well as other target materials, in order to increase the conversion efficiency of the source and therefore further drive down its CoO. We have prepared a source roadmap in response to industry demands, and it shows that the combination of our demonstrated laser technology with available targets will meet the requirements for a production level source.

引用

页码：145 / 151

页数：7

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