Interaction between SiO2 and a KF-KCl-K2SiF6 Melt

被引：48

作者：

Zaykov, Yurii P. ^{[1
]}

Isakov, Andrey V. ^{[1
]}

Zakiryanova, Irina D. ^{[1
]}

Reznitskikh, Olga G. ^{[1
]}

Chemezov, Oleg V. ^{[1
]}

Redkin, Alexander A. ^{[1
]}

机构：

[1] Russian Acad Sci, Ural Branch, Inst High Temp Electrochem, Ekaterinburg 620990, Russia

来源：

JOURNAL OF PHYSICAL CHEMISTRY B | 2014年 / 118卷 / 06期

关键词：

SILICA; FLUORINE;

D O I：

10.1021/jp4086816

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The solubility mechanism of silica in a fluoride chloride melt has been determined in situ using Raman spectroscopy. The spectroscopy data revealed that the silica solubility process involved Si-O bond breakage and Si-F bond formation. The process results in the formation of silicate complexes, fluorine-bearing silicate complexes, and silicon tetrafluoride in the melt. Mass spectrometry of the vapor phase over the KF-KCl-K2SiF6 and KF-KCl-K2SiF6-SiO2 melts and differential scanning calorimetry coupled with thermal gravimetric analysis of these melts were performed to verify the silica solubility mechanism.

引用

页码：1584 / 1588

页数：5

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