The effect of H-2 on morphology evolution during GaN metalorganic chemical vapor deposition

lit situ optical reflectance transients reveal that the morphology evolution of the initial low-temperature buffer layer strongly influences the structural and electrical quality of the high-temperature GaN films. Moreover, the morphology evolution of that buffer layer, specifically evolution of the spatial and orientational distributions of the nuclei, is strongly affected by H-2. The growth conditions for which surface smoothness is maintained throughout the two-step growth do not necessarily produce the best quality final GaN films; instead, there may be an optimal roughness and incubation period en route to the best quality final films.