Towards a general growth model for graphene CVD on transition metal catalysts

被引：109

作者：

Cabrero-Vilatela, Andrea ^{[1
]}

Weatherup, Robert S. ^{[1
]}

Braeuninger-Weimer, Philipp ^{[1
]}

Caneva, Sabina ^{[1
]}

Hofmann, Stephan ^{[1
]}

机构：

[1] Univ Cambridge, Dept Engn, Cambridge CB3 0FA, England

来源：

NANOSCALE | 2016年 / 8卷 / 04期

基金：

英国工程与自然科学研究理事会; 欧盟地平线“2020”;

关键词：

CHEMICAL-VAPOR-DEPOSITION; HIGH-QUALITY GRAPHENE; BILAYER GRAPHENE; LARGE-AREA; CARBON DIFFUSION; COPPER; FILMS; SOLUBILITY; BOUNDARY; UNIFORM;

D O I：

10.1039/c5nr06873h

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The chemical vapour deposition (CVD) of graphene on three polycrystalline transition metal catalysts, Co, Ni and Cu, is systematically compared and a first-order growth model is proposed which can serve as a reference to optimize graphene growth on any elemental or alloy catalyst system. Simple thermodynamic considerations of carbon solubility are insufficient to capture even basic growth behaviour on these most commonly used catalyst materials, and it is shown that kinetic aspects such as carbon permeation have to be taken into account. Key CVD process parameters are discussed in this context and the results are anticipated to be highly useful for the design of future strategies for integrated graphene manufacture.

引用

页码：2149 / 2158

页数：10

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