Hemodynamics in the cephalic arch of a brachiocephalic fistula

被引:35
作者
Boghosian, M. [1 ]
Cassel, K. [1 ]
Hammes, M. [2 ]
Funaki, B. [3 ]
Kim, S. [3 ]
Qian, X. [1 ]
Wang, X. [1 ]
Dhar, P. [4 ]
Hines, J. [2 ]
机构
[1] IIT, Mech Mat & Aerosp Engn Dept, Chicago, IL 60616 USA
[2] Univ Chicago, Dept Med, Chicago, IL 60637 USA
[3] Univ Chicago, Med Ctr, Dept Med, Chicago, IL 60637 USA
[4] IIT, Dept Biomed Engn, Chicago, IL 60616 USA
基金
美国国家科学基金会; 美国国家卫生研究院;
关键词
Brachiocephalic; Fistula; Cephalic arch; Intimal hyperplasia; Stenosis; ARTERIOVENOUS-FISTULAS; VASCULAR ACCESS; HEMODIALYSIS; STENOSIS; FLOWS;
D O I
10.1016/j.medengphy.2014.03.001
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
The care and outcome of patients with end stage renal disease (ESRD) on chronic hemodialysis is directly dependent on their hemodialysis access. A brachiocephalic fistula (BCF) is commonly placed in the elderly and in patients with a failed lower-arm, or radiocephalic, fistula. However, there are numerous complications such that the BCF has an average patency of only 3.6 years. A leading cause of BCF dysfunction and failure is stenosis in the arch of the cephalic vein near its junction with the axillary vein, which is called cephalic arch stenosis (CAS). Using a combined clinical and computational investigation, we seek to improve our understanding of the cause of CAS, and to develop a means of predicting CAS risk in patients with a planned BCF access. This paper details the methodology used to determine the hemodynamic consequences of the post-fistula environment and illustrates detailed results for a representative sample of patient-specific anatomies, including a single, bifurcated, and trifurcated arch. It is found that the high flows present due to fistula creation lead to secondary flows in the arch owing to its curvature with corresponding low wall shear stresses. The abnormally low wall shear stress locations correlate with the development of stenosis in the singular case that is tracked in time for a period of one year. (C) 2014 IPEM. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:822 / 830
页数:9
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