Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2 + H2O Mixed Gas

被引：23

作者：

Ueta, Hideaki ^{[1
]}

Abe, Yoshio ^{[1
]}

Kato, Kiyohiko ^{[1
]}

Kawamura, Midori ^{[1
]}

Sasaki, Katsutaka ^{[1
]}

Itoh, Hidenobu ^{[1
]}

机构：

[1] Kitami Inst Technol, Dept Mat Sci, Kitami, Hokkaido 0908507, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2009年 / 48卷 / 01期

基金：

日本学术振兴会;

关键词：

ELECTROCHROMIC PROPERTIES; SOL-GEL;

D O I：

10.1143/JJAP.48.015501

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this study, we have examined the preparation of thin films of Ni oxyhydroxide, which are used for batteries, supercapacitors, and electrochromic devices, by reactive sputtering. Transmittance and resistivity were found to decrease with the incorporation of H2O into the sputtering gas. This indicates that the valence state of Ni atoms in the film changes from Ni2+ to Ni3+. Peaks due to Ni-OH and hydrogen bonded OH were observed by Fourier transform IR (FTIR) spectroscopy of the films sputtered in O-2 + H2O mixed gas. From the obtained results, it is confirmed that Ni oxyhydroxide films are formed by reactive sputtering in O-2 + H2O mixed gas. An electrochromic coloration efficiency of 29 cm(2)/C was obtained in 1 M KOH aqueous electrolyte solution for the Ni oxyhydroxide films. (c) 2009 The Japan Society of Applied Physics

引用

页数：4

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