Picosecond soft x-ray absorption measurement of the photoinduced insulator-to-metal transition in VO2 -: art. no. 153106

被引：72

作者：

Cavalleri, A ^{[1
]}

Chong, HHW

Fourmaux, S

Glover, TE

Heimann, PA

Kieffer, JC

Mun, BS

Padmore, HA

Schoenlein, RW

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Adv Light Source Div, Berkeley, CA 94720 USA

[3] Univ Quebec, INRS Energie & Mat, Varennes, PQ, Canada

[4] Univ Calif Berkeley, Adv Sci & Technol Grad Grp, Berkeley, CA 94720 USA

来源：

PHYSICAL REVIEW B | 2004年 / 69卷 / 15期

关键词：

D O I：

10.1103/PhysRevB.69.153106

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We directly measure the photoinduced insulator-to-metal transition in VO2 using time-resolved near-edge x-ray absorption. Picosecond pulses of synchrotron radiation are used to detect the redshift in the vanadium L-3 edge at 516 eV, which is associated with the transient collapse of the low-temperature band gap. We identify a two-component temporal response, corresponding to an ultrafast transformation over a 50 nm surface layer, followed by 40 m/s thermal growth of the metallic phase into the bulk.

引用

页码：153106 / 1

页数：4

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