Silver antimony Ohmic contacts to moderately doped n-type germanium

被引:11
作者
Dumas, D. C. S. [1 ]
Gallacher, K. [1 ]
Millar, R. [1 ]
MacLaren, I. [2 ]
Myronov, M. [3 ]
Leadley, D. R. [3 ]
Paul, D. J. [1 ]
机构
[1] Univ Glasgow, Sch Engn, Glasgow G12 8LT, Lanark, Scotland
[2] Univ Glasgow, SUPA Sch Phys & Astron, Glasgow G12 8QQ, Lanark, Scotland
[3] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
基金
英国工程与自然科学研究理事会;
关键词
MODEL-BASED QUANTIFICATION; EELS SPECTRA; SILICON; TRANSITION; DETECTORS; PROGRESS; LASER;
D O I
10.1063/1.4873127
中图分类号
O59 [应用物理学];
学科分类号
摘要
A self doping contact consisting of a silver/antimony alloy that produces an Ohmic contact to moderately doped n-type germanium (doped to a factor of four above the metal-insulator transition) has been investigated. An evaporation of a mixed alloy of Ag/Sb (99%/1%) onto n-Ge (N-D = 1 x 10(18) cm(-3)) annealed at 400 degrees C produces an Ohmic contact with a measured specific contact resistivity of (1.1 +/- 0.2) x 10(-5) Omega-cm(2). It is proposed that the Ohmic behaviour arises from an increased doping concentration at the Ge surface due to the preferential evaporation of Sb confirmed by transmission electron microscope analysis. It is suggested that the doping concentration has increased to a level where field emission will be the dominate conduction mechanism. This was deduced from the low temperature electrical characterisation of the contact, which exhibits Ohmic behaviour down to a temperature of 6.5 K. (C) 2014 AIP Publishing LLC.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Time-resolved electronic capture in n-type germanium doped with antimony
    Dessmann, N.
    Pavlov, S. G.
    Shastin, V. N.
    Zhukavin, R. Kh.
    Tsyplenkov, V. V.
    Winnerl, S.
    Mittendorff, M.
    Abrosimov, N. V.
    Riemann, H.
    Huebers, H. -W.
    PHYSICAL REVIEW B, 2014, 89 (03):
  • [2] Si ohmic contacts on N-type SiC studied by XPS
    Cichon, Stanislav
    Machac, Petr
    Barda, Bohumil
    Kudrnova, Marie
    MICROELECTRONIC ENGINEERING, 2013, 106 : 132 - 138
  • [3] Alloying of Ohmic Contacts to n-type 4H-SiC via Laser Irradiation
    Huerner, A.
    Schlegl, T.
    Adelmann, B.
    Mitlehner, H.
    Hellmann, R.
    Bauer, A. J.
    Frey, L.
    SILICON CARBIDE AND RELATED MATERIALS 2012, 2013, 740-742 : 773 - +
  • [4] Diffusion of n-type dopants in germanium
    Chroneos, A.
    Bracht, H.
    APPLIED PHYSICS REVIEWS, 2014, 1 (01):
  • [5] Structural and electrical characterizations of n-type implanted layers and ohmic contacts on 3C-SiC
    Song, X.
    Biscarrat, J.
    Michaud, J. -F.
    Cayrel, F.
    Zielinski, M.
    Chassagne, T.
    Portail, M.
    Collard, E.
    Alquier, D.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2011, 269 (18) : 2020 - 2025
  • [6] Low temperature fabrication and doping concentration analysis of Au/Sb ohmic contacts to n-type Si
    Liu, J. Q.
    Wang, C.
    Zhu, T.
    Wu, W. J.
    Fan, J.
    Tu, L. C.
    AIP ADVANCES, 2015, 5 (11):
  • [7] Ohmic Contacts With Ultra-Low Optical Loss on Heavily Doped n-Type InGaAs and InGaAsP for InP-Based Photonic Membranes
    Shen, L.
    van Veldhoven, P. J.
    Jiao, Y.
    Dolores-Calzadilla, V.
    van der Tol, J. J. G. M.
    Roelkens, G.
    Smit, M. K.
    IEEE PHOTONICS JOURNAL, 2016, 8 (01):
  • [8] n-Type Polycrystalline Germanium Layers Formed by Impurity- Doped Solid-Phase Growth
    Nozawa, Koki
    Nishida, Takeshi
    Ishiyama, Takamitsu
    Suemasu, Takashi
    Toko, Kaoru
    ACS APPLIED ELECTRONIC MATERIALS, 2023, 5 (03) : 1444 - 1450
  • [9] Electrical and Structural Analysis on the Formation of n-type Junction in Germanium
    Aziz, Umar Abdul
    Rashid, Nur Nadhirah Mohamad
    Aid, Siti Rahmah
    Centeno, Anthony
    Ikenoue, Hiroshi
    Xie, Fang
    5TH INTERNATIONAL CONFERENCE ON NANOMATERIALS AND MATERIALS ENGINEERING (ICNME 2017), 2017, 204
  • [10] Structural characterization of V/Al/V/Au Ohmic contacts to n-type Al0.4Ga0.6N
    Li Tao
    Qin Zhi-Xin
    Xu Zheng-Yu
    Shen Bo
    Zhang Guo-Yi
    CHINESE PHYSICS B, 2011, 20 (04)