Optical properties of SrMoO3 thin film

被引:43
作者
Mizoguchi, H [1 ]
Kitamura, N
Fukumi, K
Mihara, T
Nishii, J
Nakamura, M
Kikuchi, N
Hosono, H
Kawazoe, H
机构
[1] AIST, Osaka Natl Res Inst, Osaka 5638577, Japan
[2] Toray Res Ctr Ltd, Shiga 5208567, Japan
[3] Kanazawa Inst Technol, Matto, Ishikawa 9240838, Japan
[4] Tokyo Inst Technol, Ceram & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268502, Japan
关键词
D O I
10.1063/1.373111
中图分类号
O59 [应用物理学];
学科分类号
摘要
We used an rf magnetron reactive sputtering method to prepare SrMoO3 thin film on a silica glass substrate and evaluated its optical properties. The reflectivity of the blue-colored film showed a cutoff due to plasmon at similar to 1.7 eV. From a Kramers-Kronig analysis of the reflectivity, the spectral dependence of dielectric constants and optical constants were obtained. They agreed in tendency with the constants determined by spectroscopic ellipsometry. The plasma frequency due to free carriers (4.5 eV) was obtained by application of a Drude model to reflectivity values, which showed that the effective mass of the conduction carrier was m*=2.1m(0), where m(0) is the free electron mass. (C) 2000 American Institute of Physics. [S0021-8979(00)00401-1].
引用
收藏
页码:4617 / 4619
页数:3
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