Dip-pen nanolithography-based methodology for preparing arrays of nanostructures functionalized with oligonucleotides

被引：0
|
作者：
Zhang, H
Li, Z
Mirkin, CA
机构：
[1] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
[2] Northwestern Univ, Inst Nanotechnol, Evanston, IL 60208 USA
来源：
ADVANCED MATERIALS | 2002年 / 14卷 / 20期
关键词：
D O I：
10.1002/1521-4095(20021016)14:20<1472::AID-ADMA1472>3.0.CO;2-E
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Arrays of Au nanostructures have been fabricated based on dip-pen nanolithography and wet chemical etching, whereafter they can be functionalized with alkanethiol-capped oligo-nucleotides. These retain their hybridization properties on the surfaces of the nanopatterns and can react with complementary DNA or particles modified with complementary DNA.
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页码：1472 / +
页数：4
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