Spatial frequency doubling with two-step technique

被引:0
|
作者
Li, Sensen [1 ]
Chen, Lujian [1 ]
Dong, Xiaopeng [1 ]
Ren, Xuechang [2 ]
Zhang, Xiangsu [2 ]
Liu, Shou [2 ]
机构
[1] Xiamen Univ, Dept Elect Engn, Xiamen 361005, Peoples R China
[2] Xiamen Univ, Dept Phys, Xiamen 361005, Peoples R China
关键词
LITHOGRAPHY; FABRICATION; GRATINGS; MULTIPLICATION; PATTERNS;
D O I
10.1364/OL.39.002024
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The phenomenon of spatial frequency doubling generated by a two-step technique with the collimated beam at normal incidence in the second exposure is presented. Theoretical analysis demonstrates that the phenomenon is induced by the Talbot effect in photoresist and the superposition of two exposures, and the minimum achievable period of the grating with double spatial frequency can be close to one half of the exposure wavelength in vacuum, divided by the refractive index of photoresist lambda/2n. The two-step technique has the potential to be a simpler and more practical resolution-improving technique for the Talbot-effect-based approach of spatial frequency doubling. (C) 2014 Optical Society of America
引用
收藏
页码:2024 / 2027
页数:4
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