Low voltage electroluminescence of terbium- and thulium-doped zinc oxide films

被引:21
作者
Lima, S. A. M.
Davolos, M. R.
Legnani, C.
Quirino, W. G.
Cremona, M.
机构
[1] UNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil
[2] PUC Rio, Dept Fis, BR-22453900 Rio De Janeiro, Brazil
基金
巴西圣保罗研究基金会;
关键词
thin films; semiconductors; chemical synthesis; electronical transport; luminescence;
D O I
10.1016/j.jallcom.2005.10.066
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Strong interest in developing technology for visual information. stimulates research for thin film electroluminescent devices. Here, for the first time, we report that thulium- and terbium-doped zinc-oxide films are suitable for electroluminescence applications. Two different devices were assembled as lTO/LiF/ZnO:RE/LiF/Al or ITO/SiO2/ZnO:RE/SiO2/Al, where ZnO:RE is a film of zinc oxide containing 10 at% of Tb3+ or Tm3+. Electroluminescence spectra show that besides a broad emission band with maximum around 650 nm assigned to ZnO, also emission lines from Tb3+ at 484 nm (D-5(4) -> F-7(6)), 543 nm (D-5(4) -> F-7(6)), and 589 nm (D-5(4) -> F-7(4)), or from Tm3+ at 478 nm ((1)G(4) -> H-3(6)), and 511 mn (D-1(2) -> H-3(5)) were detected. Intensity of emission as function of applied voltage and current-voltage characteristic are shown and discussed. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:35 / 38
页数:4
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