Thickness measurement of thin films and multilayers using Fourier transform of X-ray reflectivity

被引：0

作者：

Tiwari, U ^{[1
]}

Sharma, RK ^{[1
]}

Sehgal, BK ^{[1
]}

Goyal, A ^{[1
]}

Sharma, BB ^{[1
]}

Kumar, V ^{[1
]}

机构：

[1] Solid State Phys Lab, Delhi 110054, India

来源：

PROCEEDINGS OF THE ELEVENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOL 1 & 2 | 2002年 / 4746卷

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin metallic layers of Pt and Au over Si and GaAs substrates grown by e-beam deposition have been investigated using grazing incidence X-ray reflectivity. FFT algorithm has been applied to determine thickness from the reflectivity curves and it has been observed that in multilayer samples and in thin films having poor fringe contrast, this method is quite useful in thickness determination with good accuracy.

引用

页码：1014 / 1017

页数：4

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