Investigation of strain-induced modulation on electronic properties of graphene field effect transistor

被引:12
作者
Dong, Jinyao [1 ]
Liu, Shuai [1 ]
Fu, Yongzhong [1 ]
Wang, Quan [1 ,2 ]
机构
[1] Jiangsu Univ, Sch Mech Engn, Zhenjiang 212013, Peoples R China
[2] Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Key Lab Nanodevices & Applicat, Beijing 100864, Peoples R China
基金
中国国家自然科学基金;
关键词
Graphene; Internal strain; Raman properties; Electrical properties;
D O I
10.1016/j.physleta.2016.11.003
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Graphene has been considered as a single sheet with sp(2)-bonded carbon atoms arranged in a two-dimensional honeycomb configuration. In our work, we demonstrate few-layer graphene field effect transistor (GFET) suspending on Si/SiO2 and utilize Raman spectroscope to characterize the strain effects of suspended graphene. We find that red shift appears in Raman G peak and 2D peak because of tensile strain on the graphene surface. Besides, we also measure output characteristic curves (I-sd-V-sd) and transfer characteristic curves (I-sd-Vg) in a four-probe configuration. Based on the out-put curves of GFET, the resistances of graphene without strain and with strain are equal to similar to 28 x 10(3) Omega and similar to 31 x 10(3) Omega, respectively. Combined with the tensile strain value of the graphene calculated by the Raman spectrum, the graphene piezo-resistive sensitivity coefficient GF = similar to 21. These results provide a theoretical basis for the preparation of high-performance graphene electronic components. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:292 / 297
页数:6
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