Wafer-level Cu-Sn micro-joints with high mechanical strength and low Sn overflow

被引:10
作者
Duan, Ani [1 ]
Luu, Thi-Thuy [1 ]
Wang, Kaiying [1 ]
Aasmundtveit, Knut [1 ]
Hoivik, Nils [1 ]
机构
[1] Buskerud Vestfold Univ Coll, Dept Micro & Nano Syst Technol, N-3184 Horten, Norway
关键词
wafer-level process; Cu/Sn SLID; microelectromechnical systems (MEMS);
D O I
10.1088/0960-1317/25/9/097001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we report wafer-level bonding using solid-liquid inter-diffusion (SLID) processes for fabricating micro-joints Cu-Sn at low temperature (270 degrees C). The evolution of multilayer Cu/ Sn to micro-joint alloys has been characterized by optical microscopy and mechanical die-shear testing. The Cu-Sn joints with line width from 80 to 200 mu m prove to be reliable packaging materials for bonding vacuum micro-cavities with controllable Sn overflow, as well as high mechanical strength (> 70 MPa). A thermodynamic model has been performed to further understand the formation of Cu-Sn intermetallic alloys. There are two important findings for this work: 1) Using a two-step temperature profile may significantly reduce the amount of Sn overflow; 2) for packaging, a bond frame width greater than 80 mu m will result in high yield.
引用
收藏
页数:5
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