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Atmospheric pressure plasma jet utilizing Ar and Ar/H2O mixtures and its applications to bacteria inactivation
被引:40
作者:

Cheng Cheng
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Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China

Shen Jie
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Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China

Xiao De-Zhi
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Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China

Xie Hong-Bing
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Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China

Lan Yan
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Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China

Fang Shi-Dong
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Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China

Meng Yue-Dong
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机构:
Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China

Paul, Chu K.
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机构:
City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China
机构:
[1] Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China
[2] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
基金:
中国国家自然科学基金;
关键词:
plasma sources;
plasma temperature and density;
plasma applications;
ELECTRON-DENSITY;
TEMPERATURE;
DIAGNOSTICS;
DISCHARGES;
ARGON;
D O I:
10.1088/1674-1056/23/7/075204
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
An atmospheric pressure plasma jet generated with Ar with H2O vapor is characterized and applied to inactivation of Bacillus subtilis spores. The emission spectra obtained from Ar/H2O plasma shows a higher intensity of OH radicals compared to pure argon at a specified H2O concentration. The gas temperature is estimated by comparing the simulated spectra of the OH band with experimental spectra. The excitation electron temperature is determined from the Boltzmann's plots and Stark broadening of the hydrogen Balmer H-beta line is applied to measure the electron density. The gas temperature, excitation electron temperature, and electron density of the plasma jet decrease with the increase of water vapor concentration at a fixed input voltage. The bacteria inactivation rate increases with the increase of OH generation reaching a maximum reduction at 2.6% (v/v) water vapor. Our results also show that the OH radicals generated by the Ar/H2O plasma jet only makes a limited contribution to spore inactivation and the shape change of the spores before and after plasma irradiation is discussed.
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