Charge Collection Mechanisms in GaAs MOSFETs

被引:8
作者
Ni, Kai [1 ]
Zhang, En Xia [1 ]
Samsel, Isaak K. [1 ]
Schrimpf, Ronald D. [1 ]
Reed, Robert A. [1 ]
Fleetwood, Daniel M. [1 ]
Sternberg, Andrew L. [1 ]
McCurdy, Michael W. [1 ]
Ren, Shufeng [2 ]
Ma, Tso-Ping [2 ]
Dong, Ling [3 ]
Zhang, Jing Yun [3 ]
Ye, Peide D. [3 ]
机构
[1] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
[2] Yale Univ, Dept Elect Engn, New Haven, CT 06511 USA
[3] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
关键词
Charge collection; GaAs; III-V; InGaAs; ion radiation effects; MOSFETs; single-event transient; technology computer-aided design (TCAD); two-photon-absorption (TPA); FIELD-EFFECT TRANSISTORS; ELECTRON-MOBILITY TRANSISTORS; TRANSIENT RADIATION RESPONSE; BUFFER LAYER; 2-PHOTON ABSORPTION; HEAVY-ION; MESFETS; FETS; SIMULATION; SEMICONDUCTORS;
D O I
10.1109/TNS.2015.2495203
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Charge collection mechanisms are investigated in surface channel GaAs MOSFETs under broadbeam heavy ion irradiation and pulsed two-photon-absorption laser irradiation. The large barrier between the gate dielectric and GaAs eliminates gate conduction current, but there is significant gate displacement current. Charge enhancement occurs because radiation-generated holes accumulate in the substrate, which increases the local electrostatic potential. The increased potential enhances the source-to-drain current, resulting in excess collected charge. The collected charge increases significantly with gate bias, due to the long tails of the charge waveforms that occur for higher gate bias. The collected charge increases with increasing drain bias.
引用
收藏
页码:2752 / 2759
页数:8
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