Edge Dislocations Triggered Surface Instability in Tensile Epitaxial Hexagonal Nitride Semiconductor

被引:9
作者
Cheng, Jianpeng [1 ]
Yang, Xuelin [1 ]
Zhang, Jie [1 ]
Hu, Anqi [1 ]
Ji, Panfeng [1 ]
Feng, Yuxia [1 ]
Guo, Lei [1 ]
He, Chenguang [1 ]
Zhang, Lisheng [1 ]
Xu, Fujun [1 ]
Tang, Ning [1 ]
Wang, Xinqiang [1 ,2 ]
Shen, Bo [1 ,2 ]
机构
[1] Peking Univ, Sch Phys, State Key Lab Artificial Microstruct & Mesoscop P, Beijing 100871, Peoples R China
[2] Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China
基金
中国国家自然科学基金;
关键词
surface instability; nanoscale fissures; edge dislocations; hexagonal nitrides; TEM; ELECTRON-MOBILITY TRANSISTORS; MOLECULAR-BEAM EPITAXY; LIGHT-EMITTING-DIODES; LOW-TEMPERATURE; ALGAN/GAN HETEROSTRUCTURES; NANOWIRE HETEROSTRUCTURES; THERMAL MANAGEMENT; GALLIUM NITRIDE; GAN; GROWTH;
D O I
10.1021/acsami.6b11124
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Understanding the semiconductor surface and its properties including surface stability, atomic morphologies, and even electronic states is of great importance not only for understanding surface growth kinetics but also for evaluating the degree to which they affect the devices' performance. Here, we report studies on the nanoscale fissures related surface instability in AlGaN/GaN heterostructures. Experimental results reveal that edge dislocations are actually the root cause of the surface instability. The nanoscale fissures are initially triggered by the edge dislocations, and the subsequent evolution is associated with tensile lattice-mismatch stress and hydrogen etching. Our findings resolve a long-standing problem on the surface instability in AlGaN/GaN heterostructures and will also lead to new understandings of surface growth kinetics in other hexagonal semiconductor systems.
引用
收藏
页码:34108 / 34114
页数:7
相关论文
共 40 条
[21]   Tensile strain-induced formation of micro-cracks for AlGaN/GaN heterostructures [J].
Kotani, Junji ;
Tomabechi, Shuichi ;
Miyajima, Toyoo ;
Nakamura, Norikazu ;
Kikkawa, Toshihide ;
Watanabe, Keiji ;
Imanishi, Kenji .
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 10, NO 5, 2013, 10 (05) :808-811
[22]   In situ measurements of the critical thickness for strain relaxation in AlGaN/GaN heterostructures [J].
Lee, SR ;
Koleske, DD ;
Cross, KC ;
Floro, JA ;
Waldrip, KE ;
Wise, AT ;
Mahajan, S .
APPLIED PHYSICS LETTERS, 2004, 85 (25) :6164-6166
[23]   Improved properties of high-Al-composition AlGaN/GaN high electron mobility transistor structures with thin GaN cap layers [J].
Li, Haoran ;
Keller, Stacia ;
DenBaars, Steven R. ;
Mishra, Umesh K. .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (09)
[24]   Dopant-free GaN/AlN/AlGaN radial nanowire heterostructures as high electron mobility transistors [J].
Li, Yat ;
Xiang, Jie ;
Qian, Fang ;
Gradecak, Silvija ;
Wu, Yue ;
Yan, Hao ;
Yan, Hao ;
Blom, Douglas A. ;
Lieber, Charles M. .
NANO LETTERS, 2006, 6 (07) :1468-1473
[25]   Sapphire substrate misorientation effects on GaN nucleation layer properties [J].
Lu, D ;
Florescu, DI ;
Lee, DS ;
Merai, V ;
Ramer, JC ;
Parekh, A ;
Armour, EA .
JOURNAL OF CRYSTAL GROWTH, 2004, 272 (1-4) :353-359
[26]   Evolution of structural defects associated with electrical degradation in AlGaN/GaN high electron mobility transistors [J].
Makaram, Prashanth ;
Joh, Jungwoo ;
del Alamo, Jesus A. ;
Palacios, Tomas ;
Thompson, Carl V. .
APPLIED PHYSICS LETTERS, 2010, 96 (23)
[27]  
MATTHEWS JW, 1974, J CRYST GROWTH, V27, P118, DOI 10.1016/S0022-0248(74)80055-2
[28]   Reliability of GaN high-electron-mobility transistors: State of the art and perspectives [J].
Meneghesso, Gaudenzio ;
Verzellesi, Giovanni ;
Danesin, Francesca ;
Rampazzo, Fabiana ;
Zanon, Franco ;
Tazzoli, Augusto ;
Meneghini, Matteo ;
Zanoni, Enrico .
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2008, 8 (02) :332-343
[29]   AlGaN/GaN HEMTs - An overview of device operation and applications [J].
Mishra, UK ;
Parikh, P ;
Wu, YF .
PROCEEDINGS OF THE IEEE, 2002, 90 (06) :1022-1031
[30]   Theory of GaN(10(1)over-bar-0) and (11(2)over-bar-0) surfaces [J].
Northrup, JE ;
Neugebauer, J .
PHYSICAL REVIEW B, 1996, 53 (16) :10477-10480