Einstein-de Haas effect in a NiFe film deposited on a microcantilever

被引:72
作者
Wallis, T. M. [1 ]
Moreland, J. [1 ]
Kabos, P. [1 ]
机构
[1] NIST, Boulder, CO 80305 USA
关键词
D O I
10.1063/1.2355445
中图分类号
O59 [应用物理学];
学科分类号
摘要
A method is presented for determining the magnetomechanical ratio g(') in a thin ferromagnetic film deposited on a microcantilever via measurement of the Einstein-de Haas effect. An alternating magnetic field applied in the plane of the cantilever and perpendicular to its length induces bending oscillations of the cantilever that are measured with a fiber optic interferometer. Measurement of g(') provides complementary information about the g factor in ferromagnetic films that is not directly available from other characterization techniques. For a 50 nm Ni80Fe20 film deposited on a silicon nitride cantilever, g(') is measured to be 1.83 +/- 0.10.
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页数:3
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