Fabrication of absorption gratings with X-ray lithography for X-ray phase contrast imaging

被引:2
作者
Wang, Bo [1 ]
Wang, Yu-Ting [1 ,2 ]
Yi, Fu-Ting [1 ]
Zhang, Tian-Chong [1 ]
liu, Jing [1 ]
Zhou, Yue [1 ,2 ]
机构
[1] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2018年 / 32卷 / 13期
基金
中国国家自然科学基金;
关键词
X-ray phase contrast imaging; X-ray lithography; high-aspect-ratio;
D O I
10.1142/S0217979218501631
中图分类号
O59 [应用物理学];
学科分类号
摘要
Grating-based X-ray phase contrast imaging is promising especially in the medical area. Two or three gratings are involved in grating-based X-ray phase contrast imaging in which the absorption grating of high-aspect-ratio is the most important device and the fabrication process is a great challenge. The material with large atomic number Z is used to fabricate the absorption grating for excellent absorption of X-ray, and Au is usually used. The fabrication process, which involves X-ray lithography, development and gold electroplating, is described in this paper. The absorption gratings with 4 pm period and about 100 mu m height are fabricated and the high-aspect-ratio is 50.
引用
收藏
页数:8
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