Photoconductive antennas based on epitaxial films In0.5Ga0.5As on GaAs (111)A and (100)A substrates with a metamorphic buffer

被引:8
|
作者
Kuznetsov, K. A. [1 ]
Galiev, G. B. [2 ]
Kitaeva, G. Kh [1 ]
Kornienko, V. V. [1 ]
Klimov, E. [2 ]
Klochkov, A. N. [2 ]
Leontyev, A. A. [1 ]
Pushkarev, S. S. [2 ]
Maltsev, P. P. [2 ]
机构
[1] Lomonosov Moscow State Univ, Fac Phys, Moscow 119991, Russia
[2] RAS, Inst Ultrahigh Frequency Semicond Elect, Moscow 117105, Russia
基金
俄罗斯基础研究基金会;
关键词
terahertz wave generation; photoconductive antenna; GaAs (111)A; time-domain spectroscopy; molecular beam epitaxy; InGaAs; MOLECULAR-BEAM EPITAXY; TEMPERATURE-GROWN GAAS; TERAHERTZ-RADIATION GENERATION; QUANTUM-WELLS; MU-M; DYNAMICS; INGAAS; INP; SPECTROSCOPY; WAVELENGTHS;
D O I
10.1088/1612-202X/aac7bb
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The terahertz (THz) wave generation by the spiral photoconductive antennas fabricated on the low-temperature and high-temperature grown undoped and Si-doped In0.5Ga0.5As films is studied by the terahertz time-domain spectroscopy method. The In0.5Ga0.5As layers were grown by molecular beam epitaxy on GaAs substrates with (100) and (111) A crystallographic orientations utilizing step-graded InxGa1-xAs metamorphic buffer. The antennas are excited by radiation of Er3+-fiber laser at 1.56 mu m wavelength in two regimes: with pulse durations of 2.5 ps or 100 fs. It is found that the THz wave generation is 3-4 times more effective in the case of InGaAs-based antennas on (111)A GaAs substrates as compared to the (100) substrates. Power-voltage characteristic of the LT-InGaAs antenna up to and beyond threshold breakdown voltage are reported.
引用
收藏
页数:7
相关论文
共 50 条
  • [1] Photoconductive antennas based on epitaxial films In0.5Ga0.5As on GaAs (111) A and (100) substrates with a metamorphic buffer
    Kuznetsov, K. A.
    Galiev, G. B.
    Kitaeva, G. Kh
    Kornienko, V. V.
    Klimov, E. A.
    Klochkov, A. N.
    Leontyev, A. A.
    Pushkarev, S. S.
    Maltsev, P. P.
    LASER PHYSICS, 2018, 28 (07)
  • [2] Epitaxial low-temperature growth of In0.5Ga0.5As films on GaAs(100) and GaAs(111)A substrates using a metamorphic buffer
    G. B. Galiev
    I. N. Trunkin
    E. A. Klimov
    A. N. Klochkov
    A. L. Vasiliev
    R. M. Imamov
    S. S. Pushkarev
    P. P. Maltsev
    Crystallography Reports, 2017, 62 : 947 - 954
  • [3] Epitaxial low-temperature growth of In0.5Ga0.5As films on GaAs(100) and GaAs(111)A substrates using a metamorphic buffer
    Galiev, G. B.
    Trunkin, I. N.
    Klimov, E. A.
    Klochkov, A. N.
    Vasiliev, A. L.
    Imamov, R. M.
    Pushkarev, S. S.
    Maltsev, P. P.
    CRYSTALLOGRAPHY REPORTS, 2017, 62 (06) : 947 - 954
  • [4] In0.5Ga0.5As quantum dot lasers grown on (100) and (311)B GaAs substrates
    Patanè, A
    Polimeni, A
    Henini, M
    Eaves, L
    Main, PC
    Hill, G
    JOURNAL OF CRYSTAL GROWTH, 1999, 201 : 1139 - 1142
  • [5] Gas-source MBE growth of metamorphic InP/In0.5Al0.5As/In0.5Ga0.5As/InAsP high-electron-mobility structures on GaAs substrates
    Ouchi, K
    Mishima, T
    Kudo, M
    Ohta, H
    2001 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, CONFERENCE PROCEEDINGS, 2001, : 51 - 54
  • [6] Photoluminescence characteristics of self-assembled In0.5Ga0.5As quantum dots on vicinal GaAs substrates
    Yeh, NT
    Nee, TE
    Shiao, PW
    Chang, MN
    Chyi, JI
    Lee, CT
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (1B): : 550 - 553
  • [7] Photoluminescence characteristics of self-assembled In0.5Ga0.5As quantum dots on vicinal GaAs substrates
    Natl Central Univ, Chung-Li, Taiwan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 1 B (550-553):
  • [8] Optical properties of an In0.5Ga0.5As nanostructure spontaneously formed on GaAs (311)A-oriented substrates
    Vaccaro, PO
    Hirai, M
    Fujita, K
    Watanabe, T
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1996, 29 (09) : 2221 - 2228
  • [9] Annealing effects on lattice-strain-relaxed In0.5Al0.5As/In0.5Ga0.5As heterostructures grown on GaAs substrates
    Central Research Laboratory, Hitachi Ltd., Kokubunji, 185-8601, Tokyo, Japan
    J Cryst Growth, (271-275):
  • [10] Annealing effects on lattice-strain-relaxed In0.5Al0.5As/In0.5Ga0.5As heterostructures grown on GaAs substrates
    Mishima, T
    Kudo, M
    Kasai, J
    Higuchi, K
    Nakamura, T
    JOURNAL OF CRYSTAL GROWTH, 1999, 201 : 271 - 275