The temperature dependence of radiative and nonradiative processes at Er-O centers in Si

被引:5
作者
Chen, TD [1 ]
Platero, M [1 ]
Opher-Lipson, M [1 ]
Palm, J [1 ]
Michel, J [1 ]
Kimerling, LC [1 ]
机构
[1] MIT, Cambridge, MA 02139 USA
关键词
silicon microphotonics; erbium doping; energy backtransfer;
D O I
10.1016/S0921-4526(99)00466-4
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Er-doped silicon is a promising material for silicon microphotonics light sources. Luminescence from Er-O centers in silicon exhibits an intensity quenching as the temperature is raised from 4 to 300K. We present the first unified description of the excitation and de-excitation processes over the entire temperature range. We model the phenomena in terms of exciton Auger, impurity Auger, and multiphonon transition processes. A set of rate equations that includes all of these processes is written to describe the energy transfer, and the normalized luminescence intensity versus temperature is computed and compared to experimental data. The proposed model fits the experimental photoluminescence data over the entire temperature range. Junction photocurrent spectroscopy measurements confirm the presence of a non-radiative multiphonon backtransfer mechanism. The photocurrent generated from the direct optical excitation of Er centers was found to increase with temperature in the form expected from the energy backtransfer model. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:322 / 325
页数:4
相关论文
共 10 条
[1]   TEMPERATURE-DEPENDENCE AND QUENCHING PROCESSES OF THE INTRA-4F LUMINESCENCE OF ER IN CRYSTALLINE SI [J].
COFFA, S ;
FRANZO, G ;
PRIOLO, F ;
POLMAN, A ;
SERNA, R .
PHYSICAL REVIEW B, 1994, 49 (23) :16313-16320
[2]   1.54-MU-M LUMINESCENCE OF ERBIUM-IMPLANTED III-V SEMICONDUCTORS AND SILICON [J].
ENNEN, H ;
SCHNEIDER, J ;
POMRENKE, G ;
AXMANN, A .
APPLIED PHYSICS LETTERS, 1983, 43 (10) :943-945
[3]  
Gregorkiewicz T, 1998, PHYS STATUS SOLIDI B, V210, P737, DOI 10.1002/(SICI)1521-3951(199812)210:2<737::AID-PSSB737>3.0.CO
[4]  
2-9
[5]   Excitation and deexcitation of Er3+ in crystalline silicon [J].
Kik, PG ;
deDood, MJA ;
Kikoin, K ;
Polman, A .
APPLIED PHYSICS LETTERS, 1997, 70 (13) :1721-1723
[6]   IMPURITY ENHANCEMENT OF THE 1.54-MU-M ER3+ LUMINESCENCE IN SILICON [J].
MICHEL, J ;
BENTON, JL ;
FERRANTE, RF ;
JACOBSON, DC ;
EAGLESHAM, DJ ;
FITZGERALD, EA ;
XIE, YH ;
POATE, JM ;
KIMERLING, LC .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (05) :2672-2678
[7]   Electroluminescence of erbium-doped silicon [J].
Palm, J ;
Gan, F ;
Zheng, B ;
Michel, J ;
Kimerling, LC .
PHYSICAL REVIEW B, 1996, 54 (24) :17603-17615
[8]   Excitation and nonradiative deexcitation processes of Er3+ in crystalline Si [J].
Priolo, F ;
Franzo, G ;
Coffa, S ;
Carnera, A .
PHYSICAL REVIEW B, 1998, 57 (08) :4443-4455
[9]   Erbium in Si: Estimation of energy transfer rate and trap depth from temperature dependence of intra-4f-shell luminescence [J].
Taguchi, A ;
Takahei, K .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (05) :2800-2805
[10]   ROOM-TEMPERATURE SHARP LINE ELECTROLUMINESCENCE AT LAMBDA=1.54-MU-M FROM AN ERBIUM-DOPED, SILICON LIGHT-EMITTING DIODE [J].
ZHENG, B ;
MICHEL, J ;
REN, FYG ;
KIMERLING, LC ;
JACOBSON, DC ;
POATE, JM .
APPLIED PHYSICS LETTERS, 1994, 64 (21) :2842-2844