Laser chemical vapor deposition of Lu2O3:Eu scintillation film

被引:6
作者
Chang, Jingyu [1 ]
Qi, Yunhang [1 ]
Zhao, Hengyu [2 ]
Mao, Rihua [3 ]
Chen, Bangrui [1 ]
Feng, He [1 ]
Xu, Zhan [1 ]
Zhang, Zhijun [1 ]
Zhao, Jingtai [1 ]
机构
[1] Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China
[2] Tongji Univ, Sch Phys Sci & Engn, Inst Adv Study, Shanghai 200092, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 201800, Peoples R China
关键词
Lu2O3:Eu; LCVD; micro-columnar film; photoluminescence properties; scintillation properties; ENERGY-TRANSFER; SITES; IONS;
D O I
10.1088/2053-1591/ab2000
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Lu2O3:Eu scintillation film is one of the most attractive candidate for the hard x-ray imaging, especially above 20 keV. A micro-columnar film with 10 mu m thickness of Lu2O3:Eu was firstly obtained by laser chemical vapor deposition on not-oriented Lu2O3 single crystal substrate. The morphology of obtained film was investigated by the scanning electron microscopy. The photoluminescence and scintillation properties were measured and discussed, including photoluminescence excitation and photoluminescence curves, photoluminescence decay curves, and x-ray excited luminescence curve.
引用
收藏
页数:6
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