Modulation of columnar crystals of magnetron sputtered Ti thin films

被引：4

作者：

Zhang, Hongkai ^{[1
]}

Li, Xiang ^{[1
]}

Su, Jingyu ^{[1
]}

Wang, Xueliang ^{[2
]}

Ma, Lingzhi ^{[1
]}

Xue, Jiawei ^{[1
]}

Li, Yanhuai ^{[1
]}

Song, Zhongxiao ^{[1
]}

机构：

[1] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, Xian 710049, Shaanxi, Peoples R China

[2] Xi An Jiao Tong Univ, Sch Energy & Power Engn, MOE Key Lab Thermofluid Sci & Engn, Xian 710049, Shaanxi, Peoples R China

来源：

THIN SOLID FILMS | 2019年 / 689卷

关键词：

Titanium; Thin films; Microstructure; Substrate temperature; Preferential growth; MECHANICAL-PROPERTIES; MICROSTRUCTURE; SUBSTRATE; TEMPERATURE; ORIENTATION;

D O I：

10.1016/j.tsf.2019.137512

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ti thin films were deposited on the AlN substrates by direct-current magnetron sputtering at temperatures ranging from room temperature to 450 degrees C. The size of columnar crystals of Ti films first decreases and then increases, the preferred orientation plane gradually changes from the (100) plane to the (110) plane and then to (101) plane, with the increasing of the substrate temperature. And significant changes in the size of the columnar crystals are accompanied by changes in the preferred orientation plane. An improved Thornton model was proposed, the formation of the initial island, preferred growth and migration of deposited atoms act together to form columnar crystals of the Ti thin film.

引用

页数：4

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