Analysis of a MgO protective layer deposited with ion-beam-assisted deposition in an AC PDP

被引：0
|
作者：
Li, Zhao Hui [1 ]
Cho, Eon Sik [1 ]
Kwon, Sang Jik [1 ]
机构：
[1] Kyungwon Univ, Coll Elect & Elect Engn, Kyunggido 461701, South Korea
来源：
JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 2006年 / 49卷 / 06期
关键词：
plasma display panel (PDP); ion-beam-assisted deposition (IBAD); secondary electron emission coefficient; cathodoluminescence (CL) spectra; SURFACE-DISCHARGE; THIN-FILMS; LUMINESCENCE; CENTERS;
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
MgO layer plays an important role for plasma display panels (PDPs). In this study, a MgO layer was deposited using the oxygen-ion-beam-assisted method while the assisting oxygen-ion-beam energy was varied from 100 eV to 500 eV. In order to investigate the relationship between the electron emission and the defect levels of the MgO layer, we measured the cathodoluminescence (CL) spectra of the MgO thin films, and we analyzed the CL peak intensity and peak transition. We found that the assisting ion-beam energy played an important role in the peak intensity and the peak transition of the CL spectrum. Crystallization of the MgO thin film was also measured using X-ray diffraction (XRD), and the surface quality was inspected using atomic forces microscopy (AFM) in order to analyze the characteristics of the MgO thin films.
引用
收藏
页码：2332 / 2337
页数：6
相关论文
共 50 条
  • [21] Optical and stress properties of ZrO2/SiO2 and TiO2/SiO2 anti-reflective coatings deposited by ion-beam-assisted deposition on a flexible substrate
    Chen, Hsi-chao
    Chang, Chun-hao
    Chen, Kun-hong
    APPLIED OPTICS, 2024, 63 (31) : 8280 - 8287
  • [22] Thickness dependence of resistivity for Cu films deposited by ion beam deposition
    Lim, JW
    Mimura, K
    Isshiki, M
    APPLIED SURFACE SCIENCE, 2003, 217 (1-4) : 95 - 99
  • [23] Comparison and combination of several stress relief methods for cubic boron nitride films deposited by ion beam assisted deposition
    Fan, Y. M.
    Zhang, X. W.
    You, J. B.
    Tan, H. R.
    Chen, N. F.
    SURFACE & COATINGS TECHNOLOGY, 2009, 203 (10-11) : 1452 - 1456
  • [24] ZnO thin films deposited by capillaritron ion beam sputtering deposition
    Chao, Liang-Chiun
    Tsai, Dong-Yi
    Shih, Yu-Ren
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2009, 267 (17) : 2874 - 2877
  • [25] Investigation of carbon nitride films deposited by ion beam-assisted deposition with low bombarding energy of N ions
    Wei, Songbo
    Shao, Tianmin
    MATERIALS CHEMISTRY AND PHYSICS, 2012, 135 (2-3) : 733 - 737
  • [26] Enhanced Thermoelectric Properties and Superlattice Structure of a Bi2Te3/ZrB2 Film Prepared by Ion-Beam-Assisted Deposition
    Tan, Ming
    Deng, Yuan
    Hao, Yanming
    JOURNAL OF PHYSICAL CHEMISTRY C, 2013, 117 (40) : 20415 - 20420
  • [27] Ion beam assisted deposition of a thin film metallic glass
    Jambur, Vrishank
    Wang, Zijian
    Sunderland, John
    Im, Soohyun
    Hu, Xuanxin
    Akinyemi, Sakiru
    Perepezko, John H.
    Voyles, Paul M.
    Szlufarska, Izabela
    THIN SOLID FILMS, 2025, 812
  • [28] Heteroepitaxial growth of single-domain cubic boron nitride films by ion-beam-assisted MBE
    Hirama, Kazuyuki
    Taniyasu, Yoshitaka
    Karimoto, Shin-ichi
    Yamamoto, Hideki
    Kumakura, Kazuhide
    APPLIED PHYSICS EXPRESS, 2017, 10 (03)
  • [29] Thickness dependence of the structural, mechanical and electrical properties of Ni films deposited on polyimide by ion beam-assisted deposition (IBAD)
    Xu, Jun
    Shao, Tianmin
    SURFACE AND INTERFACE ANALYSIS, 2013, 45 (03) : 691 - 697
  • [30] Microstructural characterization of nanocrystalline hexagonal boron nitride thin films deposited by ion-beam assisted pulsed laser deposition
    Kandadai, Venkata A. S.
    Petersen, Jacob B.
    Jasthi, Bharat K.
    SURFACE & COATINGS TECHNOLOGY, 2024, 487
12345