Optical memory effect in GaN epitaxial films

被引:28
作者
Joshkin, VA
Roberts, JC
McIntosh, FG
Bedair, SM
Piner, EL
Behbehani, MK
机构
[1] N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
[2] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695
关键词
Aluminum nitride - Epitaxial film - Gallium nitride - Optical memory effect;
D O I
10.1063/1.120414
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on memory effects in the optical properties of GaN and AIN epitaxial-films grown by atmospheric pressure metal organic chemical vapor deposition. After exposing selected areas of particular samples with He-Cd laser light (3.8 eV), we observed a persistent and marked decrease in the near band edge photoluminescence (PL) intensity emitted from these areas. This effect has been observed in epitaxial films that typically have a pyramidlike hillock surface. This ability to modulate PL emission intensity at individual points in these materials can be exploited as a method for optical data storage. A means of erasing information stored using this effect has also been investigated using lower energy (similar to 2 eV). (C) 1997 American Institute of Physics.
引用
收藏
页码:234 / 236
页数:3
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