Reactivity and Stability of Ni Nanoparticles Supported by Mesoporous SiO2 and TiO2/SiO2 for CO2 Reforming of CH4

被引:16
作者
Kim, Dae Han [1 ]
Seo, Hyun Ook [1 ]
Jeong, Myung-Geun [1 ]
Kim, Young Dok [1 ]
机构
[1] Sungkyunkwan Univ, Dept Chem, Suwon 440746, South Korea
关键词
CO2 reforming of CH4; Atomic layer deposition; Ni; Porous silica; ATOMIC LAYER DEPOSITION; CARBON-DIOXIDE; HYDROGEN-PRODUCTION; DIRECT CRACKING; PARTICLE-SIZE; METHANE; TIO2; CATALYSTS; NANOCOMPOSITE;
D O I
10.1007/s10562-013-1152-x
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
CO2 reforming of CH4 catalyzed by porous SiO2 and TiO2/SiO2-supported Ni was studied. Ni on the porous substrates was deposited using atomic layer deposition method, and after the catalytic reactions, Ni nano-particles confined within the pores of the substrates were found. Both catalysts showed comparable catalytic activity and stability. The bare SiO2-supported catalyst showed very stable reactivity for the reforming reaction with an activity loss of similar to 10 % at 850 degrees C during 29 days. Thus, the porous SiO2-supported Ni which is uniformly deposited in interior of the support could be one of the promising catalysts for CO2 reforming of CH4.
引用
收藏
页码:56 / 61
页数:6
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