Reactivity and Stability of Ni Nanoparticles Supported by Mesoporous SiO2 and TiO2/SiO2 for CO2 Reforming of CH4

被引：16

作者：

Kim, Dae Han ^{[1
]}

Seo, Hyun Ook ^{[1
]}

Jeong, Myung-Geun ^{[1
]}

Kim, Young Dok ^{[1
]}

机构：

[1] Sungkyunkwan Univ, Dept Chem, Suwon 440746, South Korea

来源：

CATALYSIS LETTERS | 2014年 / 144卷 / 01期

关键词：

CO2 reforming of CH4; Atomic layer deposition; Ni; Porous silica; ATOMIC LAYER DEPOSITION; CARBON-DIOXIDE; HYDROGEN-PRODUCTION; DIRECT CRACKING; PARTICLE-SIZE; METHANE; TIO2; CATALYSTS; NANOCOMPOSITE;

D O I：

10.1007/s10562-013-1152-x

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

CO2 reforming of CH4 catalyzed by porous SiO2 and TiO2/SiO2-supported Ni was studied. Ni on the porous substrates was deposited using atomic layer deposition method, and after the catalytic reactions, Ni nano-particles confined within the pores of the substrates were found. Both catalysts showed comparable catalytic activity and stability. The bare SiO2-supported catalyst showed very stable reactivity for the reforming reaction with an activity loss of similar to 10 % at 850 degrees C during 29 days. Thus, the porous SiO2-supported Ni which is uniformly deposited in interior of the support could be one of the promising catalysts for CO2 reforming of CH4.

引用

页码：56 / 61

页数：6

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