共 143 条
Microcontact Printing: Limitations and Achievements
被引:350
作者:

Perl, Andras
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

Reinhoudt, David N.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

Huskens, Jurriaan
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands
机构:
[1] Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands
关键词:
SELF-ASSEMBLED MONOLAYERS;
DIP-PEN NANOLITHOGRAPHY;
EDGE TRANSFER LITHOGRAPHY;
SILICON-OXIDE SURFACES;
BLOCK-COPOLYMER FILMS;
PATTERNED FLAT STAMPS;
HIGH-ASPECT-RATIO;
MOLECULAR PRINTBOARDS;
ELASTOMERIC STAMPS;
SOFT LITHOGRAPHY;
D O I:
10.1002/adma.200801864
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
Microcontact printing (mu CP) offers a simple and low-cost surface patterning methodology with high versatility and sub-micrometer accuracy. The process has undergone a spectacular evolution since its invention, improving its capability to form sub.100 nm SAM patterns of various polar and apolar materials and biomolecules over macroscopic areas. Diverse development lines of mu CP are discussed in this work detailing various printing strategies New printing schemes with improved stamp materials render mu CP a reproducible surface-patterning technique with an increased pattern resolution. New stamp materials and PDMS surface-treatment methods allow the use of polar molecules as inks.:Flat elastomeric surfaces and low-diffusive inks push the feature sizes to the nanometer range. Chemical and supramolecular interactions between the ink and the substrate increase the applicability of the mu CP process.
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页码:2257 / 2268
页数:12
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