Investigations of plasma properties during TiN deposition by a modified pulsed arc process

The modified pulsed arc process was studied by optical emission spectroscopy and ion current measurement during TiN deposition discharge. We recorded spectra of the titanium nitride deposition plasma and identified species (for example: Ti++ TiN, N-2(+), N+). We found a dependence of the normalized intensities and of the mean ion current density with increase of pulse current. Further, a higher direct current led to an increase of the normalized intensities, but the mean ion current density was not affected by this variation. These results were discussed in this paper with the aim to get a better understanding of the process. (C) 2004 Elsevier B.V. All rights reserved.