Structural Instability in Amorphous In-Ga-Zn-O Films Investigated by Mechanical Stress Analysis

被引:4
作者
Cho, Ju-Young [1 ]
Yang, Tae-Youl [1 ]
Park, Yong-Jin [1 ]
Lee, Yoo-Yong [1 ]
Joo, Young-Chang [1 ,2 ]
机构
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
[2] Seoul Natl Univ, RIAM, Seoul 151742, South Korea
关键词
GLASS-TRANSITION TEMPERATURE; THIN; RELAXATION; OXIDE; DEPENDENCE; SIMULATION;
D O I
10.1149/2.004406ssl
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous In-Ga-Zn-O (a-IGZO) experiences an inherent structural instability which restrict its applications in electronic devices. By utilizing an in-situ mechanical stress analysis, we characterized the phase and structural changes. The glass transition temperature, T-g (423-562 degrees C) and fragility (18-28) in a-IGZO films were observed to ascertain quantitative criteria for the structural stability. The structural stability near T-g was significantly reduced as the thickness decreased due to the effect of the unstable surface layer. The structural relaxation of glass below T-g was identified as the viscous flow and densification. (C) 2014 The Electrochemical Society. All rights reserved.
引用
收藏
页码:P73 / P76
页数:4
相关论文
共 18 条
[1]  
Abbaschian R., 2008, Physical Metallurgy Principles, V4th
[3]   RELAXATION IN LIQUIDS, POLYMERS AND PLASTIC CRYSTALS - STRONG FRAGILE PATTERNS AND PROBLEMS [J].
ANGELL, CA .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 131 :13-31
[4]   Interfacial Study of Metal Oxide with Source-Drain Electrodes and Oxide Semiconductor by XPS [J].
Choi, Woon-Seop .
ELECTRONIC MATERIALS LETTERS, 2012, 8 (01) :87-90
[5]   Glass transition in As10Se90 chalcogenide glass: A kinetic study [J].
Elabbar, Abdalla A. .
PHYSICA B-CONDENSED MATTER, 2008, 403 (23-24) :4328-4332
[6]   Structural relaxation in amorphous oxide semiconductor, a-In-Ga-Zn-O [J].
Ide, Keisuke ;
Nomura, Kenji ;
Hiramatsu, Hidenori ;
Kamiya, Toshio ;
Hosono, Hideo .
JOURNAL OF APPLIED PHYSICS, 2012, 111 (07)
[7]   Bottom-gate amorphous In2O3 thin film transistors fabricated by magnetron sputtering [J].
Jiao, Yang ;
Zhang, Xinan ;
Zhai, Junxia ;
Yu, Xiankun ;
Ding, Linghong ;
Zhang, Weifeng .
ELECTRONIC MATERIALS LETTERS, 2013, 9 (03) :279-282
[8]   Thickness dependence of the glass transition temperature in thin polymer films [J].
Kim, JH ;
Jang, J ;
Zin, WC .
LANGMUIR, 2001, 17 (09) :2703-2710
[9]   Maximum applied voltage detector using amorphous In-Ga-Zn-O thin-film transistor exposed to ozone annealing [J].
Kimura, Mutsumi ;
Hasegawa, Takayuki ;
Ide, Keisuke ;
Nomura, Kenji ;
Kamiya, Toshio ;
Hosono, Hideo .
SOLID-STATE ELECTRONICS, 2012, 75 :74-76
[10]   Effect of channel thickness on density of states in amorphous InGaZnO thin film transistor [J].
Lee, Sang Yeol ;
Kim, Do Hyung ;
Chong, Eugene ;
Jeon, Yong Woo ;
Kim, Dae Hwan .
APPLIED PHYSICS LETTERS, 2011, 98 (12)