X-ray lithography for 3D microfluidic applications

This work addresses the fabrication by X-ray lithography of building block structures for integrated microfluidics. In particular, we demonstrate the realization of a closed microfluidic channel based on a multiple tilted X-ray exposure scheme without the need for registration steps. This scheme is exploited also for the fabrication of metallic 2D vertical gratings that can be used as sieves or electrical detectors in microfluidic channels.. Finally, we describe a new process based on the combination of X-ray-and e-beam lithography for the realization of flyover channel connecting vertical micro-tank structures. (C) 2004 Elsevier B.V. All rights reserved.