Design and Experiment of SF6 Decomposition Product CF4 Sensor in GIS by NDIR Technology

被引:1
|
作者
Zhang Shi-ling [1 ]
机构
[1] Chongqing Elect Power Res Inst, State Grid Chongqing Elect Power Co, Chongqing, Peoples R China
关键词
NDIR technology; CF4 gas detection; GIS; Piecewise function fitting; Indication error; repetitive;
D O I
10.1109/ICCIS49662.2019.00008
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
CF4 gas is an important decomposition product of SF6 in high voltage combined electrical equipment. Its content can not only characterize the surface discharge of insulating materials, but also has the great significance for the research of potential defect diagnosis technology of high voltage combined electrical equipment based on the gas analysis. The gas sensing and the detection system of SF6 decomposition product CF4 is developed based on the NDIR technology. The system adopts the single-light source and dual-wavelength structure, which can effectively eliminate the unstable factors and has the high measurement accuracy. System was calibrated and calibrated by the linear and first-order exponential function fitting in the range of high and low ranges, and the fitting coefficients R-2 were 0.985 and 0.994 respectively, showing good consistency. Combining NDIR principle measurement technology with grey system OBGM (1, N) model fitting and prediction technology, The CF4 gas volume fraction high-precision measurement and the wide-area time interval gas concentration fitting can be realized. The experimental results show that maximum error is -4.25% within measured concentration range, which increases with the increase of gas concentration. The maximum RSD% is less than 3%, showing good stability. This system can provide the novel method for the rapid detection of CF4 gas in GIS.
引用
收藏
页码:11 / 18
页数:8
相关论文
共 50 条
  • [31] OBSERVATION OF RESONANCE MAXIMA IN H + CF4 AND H + SF6 SCATTERING
    GROVER, JR
    TOENNIES, JP
    WELZ, W
    WOLF, G
    CHEMICAL PHYSICS LETTERS, 1977, 48 (01) : 24 - 28
  • [32] Chemistry studies of SF6/CF4, SF6/O2 and CF4/O2 gas phase during hollow cathode reactive ion etching plasma
    Tezani, L. L.
    Pessoa, R. S.
    Maciel, H. S.
    Petraconi, G.
    VACUUM, 2014, 106 : 64 - 68
  • [33] FLUORINE RELAXATION BY NMR ABSORPTION IN GASEOUS CF4, SIF4, AND SF6
    MOHANTY, S
    BERNSTEIN, HJ
    JOURNAL OF CHEMICAL PHYSICS, 1970, 53 (01): : 461 - +
  • [34] Solution and displacement in monolayer and multilayer binary films of SF6 and CF4 on graphite
    Thomas, Petros
    Grogan, Michael D. W.
    Hess, George B.
    JOURNAL OF CHEMICAL PHYSICS, 2015, 143 (11):
  • [35] The current pulses characteristics of the negative corona discharge in SF6/CF4 mixtures
    高青青
    王小华
    Kazimierz ADAMIAK
    杨爱军
    刘定新
    纽春萍
    张嘉伟
    Plasma Science and Technology, 2023, (02) : 135 - 146
  • [36] Effect of collisions on the resonance vibrational polarizability of gaseous SF6 and CF4 molecules
    M. O. Bulanin
    A. P. Burtsev
    I. M. Kislyakov
    Yu. M. Sveshnikov
    Optics and Spectroscopy, 2004, 97 : 346 - 356
  • [37] Abatement of SF6 and CF4 using an enhanced kerosene microwave plasma burner
    Shin, Dong Hun
    Hong, Yong Cheol
    Cho, Soon Cheon
    Uhm, Han Sup
    PHYSICS OF PLASMAS, 2006, 13 (11)
  • [38] Breakdown voltage and PD characteristics of SF6 / CF4 mixtures in nonuniform field
    Hwang, Cheong-Ho
    Sung, Heo-Gyung
    Huh, Chang-Su
    Transactions of the Korean Institute of Electrical Engineers, 2008, 57 (04): : 635 - 640
  • [39] Vacuum ultraviolet emission from radio frequency plasmas of SF6 and CF4
    Li, J
    McConkey, JW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (04): : 2102 - 2105
  • [40] The current pulses characteristics of the negative corona discharge in SF6/CF4 mixtures
    Gao, Qingqing
    Wang, Xiaohua
    Adamiak, Kazimierz
    Yang, Aijun
    Liu, Dingxin
    Niu, Chunping
    Zhang, Jiawei
    PLASMA SCIENCE & TECHNOLOGY, 2023, 25 (02)